Materials Science In Semiconductor Processing

Materials Science In Semiconductor Processing英文簡(jiǎn)介

Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy.

Each issue will aim to provide a snapshot of current insights, new achievements, breakthroughs and future trends in such diverse fields as microelectronics, energy conversion and storage, communications, biotechnology, (photo)catalysis, nano- and thin-film technology, hybrid and composite materials, chemical processing, vapor-phase deposition, device fabrication, and modelling, which are the backbone of advanced semiconductor processing and applications.

Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.

Materials Science In Semiconductor Processing中文簡(jiǎn)介

《Materials Science In Semiconductor Processing》是一本由ELSEVIER SCI LTD出版商出版的專(zhuān)業(yè)工程技術(shù)期刊，該刊創(chuàng)刊于1998年，刊期Bimonthly，該刊已被國(guó)際權(quán)威數(shù)據(jù)庫(kù)SCI、SCIE收錄。在中科院最新升級(jí)版分區(qū)表中，該刊分區(qū)信息為大類(lèi)學(xué)科：工程技術(shù) 3區(qū)，小類(lèi)學(xué)科：工程：電子與電氣 3區(qū)；材料科學(xué)：綜合 3區(qū)；物理：應(yīng)用 3區(qū)；物理：凝聚態(tài)物理 3區(qū)；在JCR（Journal Citation Reports）分區(qū)等級(jí)為Q2。該刊發(fā)文范圍涵蓋工程：電子與電氣等領(lǐng)域，旨在及時(shí)、準(zhǔn)確、全面地報(bào)道國(guó)內(nèi)外工程：電子與電氣工作者在該領(lǐng)域取得的最新研究成果、工作進(jìn)展及學(xué)術(shù)動(dòng)態(tài)、技術(shù)革新等，促進(jìn)學(xué)術(shù)交流，鼓勵(lì)學(xué)術(shù)創(chuàng)新。2021年影響因子為4.644，平均審稿速度約1.7個(gè)月。

中科院分區(qū)最新升級(jí)版（當(dāng)前數(shù)據(jù)版本：2021年12月最新升級(jí)版）

大類(lèi)學(xué)科	分區(qū)	小類(lèi)學(xué)科	分區(qū)	Top期刊	綜述期刊
工程技術(shù)	3區(qū)	ENGINEERING, ELECTRICAL & ELECTRONIC 工程：電子與電氣 MATERIALS SCIENCE, MULTIDISCIPLINARY 材料科學(xué)：綜合 PHYSICS, APPLIED 物理：應(yīng)用 PHYSICS, CONDENSED MATTER 物理：凝聚態(tài)物理	3區(qū) 3區(qū) 3區(qū) 3區(qū)	否	否

JCR分區(qū)（當(dāng)前數(shù)據(jù)版本：2021-2022年最新版）

JCR分區(qū)等級(jí)	JCR所屬學(xué)科	分區(qū)	影響因子
Q2	MATERIALS SCIENCE, MULTIDISCIPLINARY	Q2	4.644
	PHYSICS, APPLIED	Q2
	PHYSICS, CONDENSED MATTER	Q2
	ENGINEERING, ELECTRICAL & ELECTRONIC	Q2

期刊指數(shù)

影響因子	h-index	Gold OA文章占比	研究類(lèi)文章占比	OA開(kāi)放訪問(wèn)	平均審稿速度
4.644	49	1.53%	98.85%	未開(kāi)放	約1.7個(gè)月

IF值(影響因子)趨勢(shì)圖